TECHNICAL DATA SHEET

Chemical composition:

Ester of 2-diazo-1-naphthol-4-sulphonic acid and cresol-formaldehyde nonolak resin.

Applications:

Used as Positive working lithographic coating or resist with Resin N1.

Solubility:

Soluble in:
Insoluble in:
Acetone Water
Ethanol Hydrocarbons
Methoxy-propanol  
Glycol ethers  


Advantages:

High solubility in coating solvents with no risk of crystalisation at high solids content.

High sensitivity, good stability and ease of development with alkaline solutions.

Good image resistance to developers.

 

 

POSITIVE DIAZO

P25

positive diazo P25 offset litho printing chemical

 

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P J S CHEMICALS
Unit 8, Guardian Park, Station Road Ind. Estate,
TADCASTER, North Yorkshire LS24 9SG, UK
Tel: (01937) 832928 Fax: (01937) 834852

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