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TECHNICAL DATA SHEET
Chemical composition:
Ester of 2-diazo-1-naphthalene-5-sulphonic
acid and phenol-formaldehyde nonolak resin.
Applications:
Used directly as Positive working lithographic
coating or resist.
Solubility:
Soluble
in: |
Insoluble
in: |
| Acetone |
Water |
| Ethanol |
Hydrocarbons |
| Methoxy-propanol |
|
| Glycol ethers |
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Advantages:
High solubility in coating
solvents with no risk of crystalisation
at high solids content e.g. during roller
coating.
High sensitivity, good
stability and ease of development with
alkaline solutions.
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