|
TECHNICAL DATA SHEET
Chemical composition:
Ester of 2-diazo-1-naphthol-5-sulphonic
acid and cresol-formaldehyde nonolak resin.
Specification:
U
V absorption: Lamda max of 0.5g/L solution
@ 377 nm 1.0 - 1.4
Applications:
Used directly as
Positive Working lithographic coating
or resist.
Solubility:
Soluble
in: |
Insoluble
in: |
| Acetone |
Water |
| Ethanol |
Hydrocarbons |
| Methoxy-propanol |
|
| Glycol ethers |
|
Advantages:
High sensitivity, good
stability and ease of development with
alkaline solutions. |
