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TECHNICAL DATA SHEET
Chemical composition:
2-diazo-1-naphthol-5-sulphonic acid ester
of acetone-pyrogallol resin.
Specification:
UV absorption; lamda max of 0.5g/L soln
@ 377 nm; 0.75
Applications:
Used in a Positive
working lithographic coating or resist.
Solubility:
Soluble
in: |
Insoluble
in: |
| Acetone |
Water |
| Ethanol |
Hydrocarbons |
| Methoxy-propanol |
|
| Glycol ethers |
|
Advantages:
High sensitivity, good stability and
ease of development with alkaline solutions.
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